To expedite CD-SEM recipe creation, it is essential to allow end users to create CD-SEM recipe in fully automated mode using design layout information. Recipes are generated based on the design information. DesignGauge automatically generates a matching template from …

A Critical Dimension SEM (CD-SEM: Critical Dimension Scanning Electron Microscope) is a dedicated system for measuring the dimensions of the fine patterns formed on a semiconductor wafer. CD-SEM is mainly used in the manufacturing lines of electronic devices of semiconductors .

DesignGauge-AnalyzerPlus is the advanced data analysis station which provides offline post measurement, contour extraction using SEM images and measurement result acquired from CD-SEM

A lot of automation: No recipe needed! Why analytic, not Monte Carlo? No need for libraries! Can CDs and SWA be measured from top down SEM images? If so, this means fast feedback and considerably lower cost! Side wall angles: the results are very repeatable: 0.4 degree (3-sigma)! Thank you for your attention!

Mar 24, 2006 · A new trend in CD-SEM utilization is the implementation of automated recipe generation of complex CD-SEM recipes. The DesignGauge system uses design-to-SEM recipe creation and data collection. Once the recipe creation flow is implemented, the task of recipe creation can be accomplished within minutes.

Critical Dimension Scanning Electron Microscope (CD-SEM) recipe creation needs sample preparation necessary for matching pattern registration, and recipe creation on CD-SEM using the sample, which hinders the reduction in test production cost and time in semiconductor manufacturing factories.

CD-SEM is a tool used for i) Measuring the lines and holes and other fine feature patterns produced on semiconductor wafers. [2] Those are obtained by deriving a critical dimension (CD) from a pair of parallel edges extracted from the images.

Dec 5, 2015 · We propose a technique to generate the measurement recipe automatically based on design data of the pattern layout. The proposed method extracts all measureable pattern candidates by evaluating...

May 10, 2005 · This article discusses the significant benefits of the tight integration of design and process metrology for OPC implementation in a new technology node, and provides some examples of the novel OPC-Check application as currently implemented at AMD SDC with Applied Materials CD-SEM tools.

May 1, 2005 · Automating CD-SEM recipes at the early stages of process development can accelerate technology characterization, segmentation of variance and process improvements.