AKT®-PiVot™ 25PX PVD. The AKT-PiVot System 25KPX PVD is an advanced physical vapor deposition (PVD) system specifically designed for the Gen6 LTPS (Low-Te... Read more

The AKT-PiVot System 25K DT PVD, 55K DT PVD and 100K PVD deposit critical film layers such as ITO, IGZO and Metal that create TFTs and interconnects for glass sizes from Gen6 (1500x1850 mm²), Gen8.5 (2200x2500 mm²) up to Gen11 (2940x3370 m²) respectively.

The AKT-PiVot System 25KPX PVD is tailored for the Gen6 (1500x1850 mm²) LTPS/LTPO mobile market depositing critical film layers IGZO, ITO and Metal for TFTs and interconnects.

AKT-PiVot卓越的均匀性、微粒控制能力及稳定的性能，可助力显示面板制造企业生产更高像素、更小晶体管和更高帧率的新一代电视面板。 独有的阴极旋转技术精准控制磁极以调整图层达到极致的稳定性和均匀度，尤其是mura-free的IGZO膜层将有效解决金属氧化物 (MOx)LCD和OLED面板生产中的关键问题。 此外，旋转技术将靶材使用率提高至70%以上，相较平面靶材大大节省了目标靶材的成本。 当晶体管尺寸不断缩小而基板尺寸的增大，均匀性和微粒控制对良率的影响越 …

Oct 22, 2007 · The new system combines key innovations with Applied's field-proven components to provide customers with a unique, high-reliability PVD tool specifically designed to increase the productivity and reduce the cost of manufacturing large-sized LCD TV panels.

On October 16th, Applied Materials announced new technology systems for manufacturing IGZO TFT: the AKT-PiVot® 55K DT PVD, Applied AKT-PiVot 25K DT PVD and Applied AKT 55KS PECVD systems. Applied Materials supply two sizes of IGZO manufacture equipment: One is for Gen 8.5, 2200mmX2500mm mother glass.

Applied Materials, Inc. today announced that it has expanded its breakthrough AKT- PiVotT 55KV PVD* system to include advanced copper deposition processing for manufacturing TFT-LCD* flat panel displays (FPD).

The AKT®-PiVot™ DT PVD series, including the 25K DT PVD, 55K DT PVD, and 100K PVD systems, represents a family of advanced physical vapor deposition (PVD) tools engineered to deposit critical film layers in a variety of high-tech applications.

Applied's new AKT 55KS PECVD system brings market-leading precision PECVD technology to 2200mm x 2500mm size substrates. It deposits a dielectric-layer interface for MO transistors with a new advanced-quality silicon oxide (SiO2) process that minimizes hydrogen impurities to improve long-term transistor stability and optimize screen performance.

AKT’s proven architecture and processes optimize yield, productivity, and reliability; making us the market leader in Flat Panel Display PECVD equipment with over 750 PECVD systems in the field. • Standard: Up to five AKT-APX L ™ PECVD single-substrate process chambers • One Triple Single-Slot Loadlock (TSSL) or