A new lithography library brings mask optimization operations to GPUs. There are so many challenges in producing modern semiconductor devices that it’s amazing for the industry to pull it off at all.

Of course, 18A is the final part of Intel's bold "five nodes in four years" plan (also known as 5N4Y), which kicked off with ...

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Europe funds power fab; PDF's security acquisition; tariffs; NIST concerns; new ALD tool; Malaysia's advanced packaging fab; ...

The Trump-tariff love fest is clearly going to run and run. But for what it's worth, the latest PC-relevant development ...

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The new production capability in Belgium is in addition to existing CMP slurry production sites in Arizona, USA, Hsinchu and ...

The Oppo Find N5 is a masterclass in elegance and sophistication in technology. It is bigger, but slimmer and lighter. And ...

When building a new desktop or choosing a laptop, it's reasonable to want to pick out the fastest CPU to give you the maximum possible performance. That said, you should choose your next processor ...

Nadella also says the company wants to be in gaming for gaming's sake: "Flight Simulator was a product long before we even ...

Systematic defects are related to process technology due to limitation of lithography process which increased the variation in desired and printed patterns. Another aspects of process related problem ...

The race to optimize transistors is in full swing, as chip manufacturers push for more performance while improving energy ...