Extreme-ultraviolet (EUV) lithography involves wavelengths of 13.5 nm, and thus represents the next significant step in the reduction of feature sizes on integrated circuits.

We can also use wavelengths to calculate refractive index. By substituting \(v_{1}=f\lambda _{1}\) and \(v_{2}=f\lambda _{2}\) into \(n=\frac{v_{1}}{v_{2}}\) then ...

As waves travel, they set up patterns of disturbance. The amplitude of a wave is its maximum disturbance from rest (its undisturbed position). Key fact It is important to note that the amplitude ...

More information: Zhaoyang Li et al, Single-wavelength size focusing of ultra-intense ultrashort lasers with rotational hyperbolic mirrors, Advanced Photonics Nexus (2024).