Nanostencil lithography (NSL) is a shadow-mask-based nanopatterning technique that allows for the direct deposition of materials through a stencil mask with nanoscale openings. It enables the ...

Through via hole fabrication process by deep reactive-ion etching (DRIE): (a) Sample cleaning; (b) Deposition of mask material; (c) Transfer of desired pattern; (d) Desired pattern achieved; (e) ...

Previous photolithography technologies used transmissive masks protected by a pellicle. For EUV lithography, however, the masks must be reflective and cannot have a protective pellicle as this ...

Now high NA lithography can achieve nearly three times greater feature density, critical for IC device nodes of 2nm and smaller. Although NA EUV is enabling tighter resolution, the anamorphic imaging ...

An image of a mask containing the structure of an integrated ... a disk measuring 300 mm in diameter. Interestingly, DUV lithography at a wavelength of 193 nm has dominated the field much longer ...