EUV tools with a 11.2nm wavelength The Russian semiconductor initiative is led by Nikolay Chkhalo from the Russian Academy of Sciences’ Institute of Microstructure Physics. The plan is to build ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

There is interest in ASML's EUV machine bookings, commentary on the recent DeepSeek developments and export controls. Get two weeks of free access to pro-level trading tools, including news ...

The Harbin Institute of Technology scientists claimed to have developed a compact and stable source of EUV light that could then be used to manufacture advanced, sub-7nm chips. Currently ...